Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
Process design kits consist of a set of files that typically contain descriptions of the basic building blocks of the process. They are expressed, algorithmically, as Pcells. These descriptions are ...
Building performance is a hallmark of architecture in the 21st century. With buildings and the construction industry being significant contributors to carbon emissions, designers must do everything to ...
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